
- Hitachi CaF2 single crystals are developed for next generation lithography lens applications. The design rule of semiconductor has been continuously shrinking which requires stepper machines employing shorter wavelength. This makes CaF2 single crystals, which excel synthetic quartz in transmittance, crucial. With the original know-how cultivated into the growth technology for GSO single crystal, we are capable of producing large size CaF2 single crystal with excellent properties.
Features
| High Laser Resistance |
: No performance degradation under ArF laser irradiation |
| High refractive-index homogeneity and low birefringence |
: Original low stress growth technology and high precision annealing technology
to achieve the high refractive-index homogeneity and low birefringence |
| Good transmittance |
: Very good transmittance at 193 nm achieved by original know-how in scavenger
optimization |
| High growth yield and stable supply |
: Two times more growth efficiency than that is attained conventionally |
| Selective orientations |
: Both <111> and <100> with ease |
Characteristics
| Crystal size |
≧Ф240 mm |
| Crystal orientation |
<111> & <100> |
| Birefringence |
≦0.2 nm/cm at 633 nm (mean) |
| Homogeneity |
<20 ppb (RMS) |
| Transmittance |
>99.9% @ 193 nm |
| Laser resistance |
<0.1% @ 193 nm |
Applications
- Illumination and projection lens for ArF & ArF immersion exposure tools
- Window material for the laser light sources of ArF and KrF exposure tools
CaF2 single crystal for semiconductor lithography
The design rule for the mass production of advanced LSI and memory IC products shifts from the current 90 nm to 65 nm and 45 nm nodes and the development of corresponding system engineering is also being accelerated further. Lithography technology plays an important role for patterning the original circuit from the mask (reticle) on to the wafer through the photoresistive resin (photoresist) using exposure equipment, such as a stepper and a scanner. For the pattern size of 65 nm and beyond, ArF and ArF immersion equipment become in use, for which CaF2 single crystal, which excels synthetic quartz in transmittance and laser resistance, is important.
The technical issues of manufacturing of CaF2 single crystal
 |
| CaF2 Crystal structure |
 |
| <111> single crystal |
 |
 |
<100> single crystal |
<110> single crystal |
CaF2 is very difficult to obtain in the form of single crystal because of its tendency to form multi-grains and its preferential growth direction different from the required <111> and <100>. Although the vacuum Bridgman method generally used for growing CaF2 single crystal has simple equipment structure and enlargement of crystal size is easier, there is also a problem of easy formation of polycrystals.
Moreover, since the preferential growth direction of CaF2 single crystal is close to the <110> direction, the controlled growth along <111> direction is difficult.
In addition, there are some technical issues also in obtaining the crystal without defects and stress which is very important when the crystal is to be used in the semiconductor lithography field.
Technology of CaF2 single crystal growth at Hitachi Chemical
 |
 |
| The heat flow in vacuum Bridgman furnace visualized by computer simulation |
High quality CaF2 lenses suitable for lithography applications |
In Hitachi Chemical, stable supply of high quality CaF2 single crystal is ensured with the efficient direction controlled growth technology combined with advanced system engineering, such as understanding of growth environment based on crucible structure and simulation analysis of heat flow.
We succeeded in obtaining large size CaF2 single crystal for the semiconductor lithography lenses which have a high level of optical quality with good reproducibility by further establishing low stress growth technology and high precision annealing technology.
It is expected that this CaF2single crystal will contribute to the progress in the semiconductor lithography field from now on.
Example for use
Term description
| Crystal |
: The periodic arrangement of atoms in a solid. |
| Single crystal |
: The crystal in which crystal orientation is equal in all the places. |
| Polycrystal |
: The crystal which consists of crystal grains from which crystal orientation is differed. |
