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Photosensitive Dry Film "Photec"

Image of <Photec>
RY-3600 series are aqueous type photosensitive films used for high density semiconductor package such as BGA, CSP and so forth. RY-3600 series have excellent adhesion and resolution and less resist foot and the other advantage.

Features

  • These films are suitable for semi-additive process with high adhesion, high resolution and stable line width.
  • Shorter resist foot can contribute to finer pattern manufacturing. Excellent resist profile (smooth resist side wall) results in smooth plating line profile.
Photo characteristics
Item Unit RY-3625 RY-3525
Thickness μm 25 25
Photosensitivity*1 mJ/cm2 95 110
Adhesion*1(L/S=x/3x) μm 8 10
Adhesion*1(L/S=x/1000) μm 9 11
Resolution*1(L/S=3x/x) μm 9 10
Stripping time*2 sec. 33 48
Stripped flake size*2 5 2

*1:Exposure energy:ST=14/41
*2:12vol% R-100S(Mitsubishi Gas Chemical Ltd.)

Pattern profile(RY-3625)
Plating profile after resist stripping L/S=7µm/7µm Resist profile L/S=4μm/12μm

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